Added Value and Synergies

The new deposition and atomic precision etch infrastructure will offer many opportunities for the creation of new materials and devices, and allow a large number of research groups to compete in emerging fields, such as spintronics, quantum electronics, quantum optoelectronics, 2-D materials-based electronics, neuromorphic computing or NEMS.

We expect that the facility will allow researchers to try new approaches on cutting edge technology in other areas such as plasmonics, MEMS, embedded electronics, energy harvesting microsystems and flexible/organic electronics, and broader nanomanufacturing when nanocomponents are required.

The plasma etching and materials deposition equipment to be acquired within this project will become part of the National Research Infrastructure, INNOVATION-EL. It will enable researchers and developers from academia, research centers and the industry not only to better study and control the properties of new classes of materials or structures at the nanoscale, but also to progress the development of demonstration products and processes as well as to integrate and package components for a wide range of devices.

Already, more than 15 letters of support from Greece and Europe accompany this project. In the course of the project, specific demonstrators showing the potential of the infrastructure will be developed by the Research Team under the PI coordination involving all participating researchers.

It is clear that this new research facility will also open up new opportunities for the the whole research team establishing new collaboration given the new capacity. The team will also benefit from the experience of the core partners of INNOVATION-EL through their participation to Large European infrastructures like H2FC, ENI2, SiNANO, ESMI, LASERLAB EUROPE, the ESFRI infrastructure ELI and Europe’s 10 year Future and Emerging Technology “Graphene Flagship”.