Objectives

The objectives of PlasmaForNano is to provide new tools for the full exploitation of the micro/nanotechnology existing infrastructure as well as the development of novel processes, devices and micro / nano systems within the Greek research ecosystem.

Therefore the project aims to the following:

Augmenting an already unique infrastructure for Greece with the means of and expanding in an exponential way its fabrication capabilities through the synergy and complementarity of a metallic and inorganic material etching of large samples with precise dimensional control at the atomic level (ICP etcher with ALE capability) and metal multiple-target electron-beam (e-beam) evaporation system.

Demonstration of novel processes enabled by the new tools that will form the first steps towards developing breakthrough devices and disruptive technologies all “made in Greece”.

Developing access policies and integrating the new infrastructure into the existing one.

Due to the synergy with the existing infrastructure of the host institution, the new facility will provide a one-stop shop capability to:

Deposit a large variety of ultrathin inorganic films and multilayers,

create and transfer a large variety of materials and nanolithography patterns,

deploy plasma etching capabilities with atomic precision control as well as plasma etching capabilities for a wide spectrum of materials not possible today,

integrate all of the aforementioned new capabilities into realizing novel devices/systems as well as three-dimensional nanoarchitectures of increased complexity and/or precision.