The ambition and goal of this project is to provide the means for metallic and inorganic material nanopatterning in Greece and their deployment into functional nanoelectronic, photonic, sensing or other devices and micro-nano systems.

No such capability in its full extent exists today in the country’s research infrastructure innovation-el, despite the operation of an electron beam lithography tool, capable of producing lithographic features as small as 8nm in the clean room of NCSR Demokritos.

This gap is due to the lack of appropriate film formation and pattern transfer (etching) capability of an analogous precision suitable for the development of novel nanoelectronics devices and systems.

The project HFRI-FM17C3-2917 is funded by H.F.R.I., with a total budget of €1.439.424,00